Mold Surface Treatment for Imprint Lithography.
نویسندگان
چکیده
منابع مشابه
Imprint lithography for integrated circuit fabrication
The escalating cost for next generation lithography ~NGL! tools is driven in part by the need for complex sources and optics. The cost for a single NGL tool could exceed $50M in the next few years, a prohibitive number for many companies. As a result, several researchers are looking at low cost alternative methods for printing sub-100 nm features. In the mid-1990’s, several research groups star...
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Imprint lithography is emerging as an alternative nano-patterning technology to traditional photolithography that permits the fabrication of 2D and 3D structures with <100 nm resolution, patterning and modification of functional materials other than photoresist and is low cost, with operational ease for use in developing bio-devices. Techniques for imprint lithography, categorized as either 'mo...
متن کاملStep and Flash Imprint Lithography
The goal of the SFIL development program is to enable patterning of sub-100 nm features at room temperature and with minimal applied pressure. We believe the use of low viscosity materials and photopolymerization chemistry will enable SFIL to achieve the throughput required for use in the microelectronics industry. Additionally, the rigid transparent imprint template used in SFIL enables a prec...
متن کامل3D Simulation of Nano-Imprint Lithography
A proof of concept study of the feasibility of fully three-dimensional (3D) time-dependent simulation of nano-imprint lithography of polymer melt, where the polymer is treated as a structured liquid, has been presented. Considering the flow physics of the polymer as a structured liquid, we have followed the line initiated by de Gennes, using a Molecular Stress Function model of the Doi and Edwa...
متن کاملDesign of Orientation Stages for Step and Flash Imprint Lithography
This paper presents the design of orientation stages for high-resolution imprint lithography machines. These machines implement a new lithography process known as Step and Flash Imprint Lithography (SFIL) and are intended for 1) sub 100 nm imprint demonstrations on flat substrates and 2) investigation of potential defect propagation during step and repeat imprinting. SFIL is an imprint lithogra...
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ژورنال
عنوان ژورنال: Journal of Photopolymer Science and Technology
سال: 2001
ISSN: 0914-9244,1349-6336
DOI: 10.2494/photopolymer.14.457